Cleaning of substrates and ampoules

Both glass substrates (industrial quality microscope slides) and quartz ampoules were cleaned especially carefully using the following steps:

1. Immersing in "aqua regia" for minimally 24 hours
2. Mechanical washing and rinsing by water-detergent solution (substrates only)
3. Rinsing by demineralised water (both substrates and ampoules)
4. Rinsing by isopropyl alcohol (both substrates and ampoules)
5. Drying of substrates on centrifuge to remove remaining isopropyl alcohol
6. Final surface enhancing of substrates in TESLA 214 VT plasmatic etching device (10-12 minutes, residual pressure 1-3 Pa) immediately before films deposition