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Thin films were prepared by thermal evaporation under high vacuum.
To obtain homogeneous films thickness the substrates were mounted
on a planetary rotating system. Evaporating device TESLA UP 858
was used. Deposition rate was 0-20 Å/s, residual pressure
Pa. The crushed bulk material was evaporated
from quartz crucible heated up by a molybdenum wire. Prepared thin
films were stored in dark and dry environment until further usage.