Thin films deposition

Thin films were prepared by thermal evaporation under high vacuum. To obtain homogeneous films thickness the substrates were mounted on a planetary rotating system. Evaporating device TESLA UP 858 was used. Deposition rate was 0-20 Å/s, residual pressure  1-2 $\times 10^{-4}$ Pa. The crushed bulk material was evaporated from quartz crucible heated up by a molybdenum wire. Prepared thin films were stored in dark and dry environment until further usage.