Next: Diffractive properties measurements
Film thickness and deposition rate were measured in-situ during
depositions and after evaporation too. Dynamic weigh system
MSV-1843/A by MIKI-FFV based on detuning of silicon oscillator was
used. The density of the evaporated As-S system was essential to
determine the film thickness. This data was taken
from [24,54] and adjusted slightly due to
higher structural disorder in as-evaporated thin films.
A mechanical profilometer Tencor P2 equipped with diamond tip was
used to determine film thickness after film deposition as well.
To avoid any doubts, the Metricon 2010 prism coupler was used to
control deposited film thickness. It uses the principle of
coupling and decoupling (ergo waveguiding mode) of laser beam into
investigated film. It employs prism and pneumatically operated
The film thickness was also controlled by AFM microscopy. This
method is described later in the text.